Films Deposited
Wet oxidation
1. Piranha/HF clean
1.1 Piranha clean
1.2 10:1 HF dip
2. Wet oxidation @ 1100 degrees C, 4 hours
DC-magnetron sputtering
1. 0.13 um Titanium/Tugnsten (TiW)
2. 0.44 um Aluminum (Al)
(without breaking vacuum between depositions)