>>> 'mti' problem from bill -- Wed Jan 17 08:32:25 1990 <<<

The MTI is up to its old trick :
chuck speed 6000 rpm's regardless of program request.
I tried programs #1, #10, and #50 - they all go at 6000 rpm's
on all steps.

The problem log shows this problem first appearing 3/89,
fixed itself occasionally, Then Robert attacked it - and it
worked fine till June. In June it fixed itself - so we can
only hope this time.

I powered off/on many times  - but the problem remains at ther moment.

>>> 'mti' problem from rnorman -- Wed Jan 17 09:35:55 1990 <<<

Problem: Chuck speed at 6000 RPM regardless of recipe.

Solution: I ran 10 wafers and could not duplicate the problem.
          This problem has occurred before intermittantly.
          The mti is up.

>>> 'mti' problem from marilyn -- Thu Jan 18 13:29:04 1990 <<<

Problem: SPACER ERROR RETRACT LIMIT shows on the screen; the MTI
         will not operate with this error.

>>> 'mti' problem from debra -- Thu Jan 18 13:57:29 1990 <<<

spacer arm had not fully retracted therefore not tripping
the limit switch. I manually tripped limit switch and
restarted. Seems to operate normally now.

>>> 'mti' problem from jiahua -- Wed Jan 24 13:45:21 1990 <<<

It says: the carrier monitor limited unmade.

>>> 'mti' problem from marilyn -- Thu Jan 25 10:53:26 1990 <<<

Problem: carrier monitor limit unmade
Solution: the mti is up/temporary hang-up

>>> 'mti' problem from spence -- Fri Jan 26 13:41:00 1990 <<<


The chuck spin speed during acetone dispense is 1000rpm
for program 10 (resist strip) is this normal? It seems a little high to me
though the wafer looked clean enough afterwards!

>>> 'mti' problem from rnorman -- Fri Jan 26 14:02:00 1990 <<<

The spin on the acetone dispense of 1000 rpm's is normal; this is
programed in and can be changed by the programmer.
The mti is up.

>>> 'mti' problem from ried -- Sat Feb  3 00:11:14 1990 <<<

Mti works fine, but vent on developer tank does not seem to work by 
simply turning metal switch.  It was necessary to adjust the black
plastic pressure controller knob to vent the tank.

>>> 'mti' problem from rnorman -- Fri Feb  9 09:16:04 1990 <<<

Problem: Developer tank not venting when black valve is turned.

Cause: The N2 regulator was acting like a check valve, preventing
       the N2 from flowing back up through to vent out the black knob.

Solution: The black N2 vent valve was moved to the other side of the
          regulator of the developer tank. Also another black 
          N2 shutoff valve was put on the acetone tank,
          you will use this for stopping the N2 flow before
          venting the tank. Both tanks have been tested and the
          mti is up.

>>> 'mti' problem from liew -- Tue Feb 13 23:22:00 1990 <<<

Chuck speed during developing was 6000rpm

>>> 'mti' problem from rnorman -- Wed Feb 14 09:53:31 1990 <<<

The mti chuck speed is stuck at 6000 RPM, this is an intermittent
problem that comes and goes.  The last time it a chip latched up,
but durring the troubleshooting it went away; I will try to pick up
were I left off last time.   The mti is only good for stripping
wafers, and other programs not related to developing wafers.  The
mti is down.

>>> 'mti' problem from rnorman -- Wed Feb 14 14:13:20 1990 <<<

Problem: Chuck spins at 6000 RPM on all programs.

Solution: After turning the power on and off a couple times
          the problem went away.  It seems to be a chip
          latching up intermittently.  The mti is up for all use.

>>> 'mti' problem from ling -- Mon Mar 19 17:50:37 1990 <<<

aceton is  used out when i started to strip resist on my wafer.
With someone's help, we refilled three bottles aceton. Unfortuntely,
rubby O-ring of aceton container is droped into the aceton container
(we don't know how and when). Now, we used another O-ring without
took dropped O-ring out. Please do something necessary or contact with me.
Thanks
zml

>>> 'mti' problem from rnorman -- Tue Mar 20 07:24:03 1990 <<<

Problem: Sealing o-ring fell into the acetone tank.

Solution: The o-ring was removed and placed in a plastic
          bag next to the acetone tank.  The mti is up.

>>> 'mti' problem from judy -- Wed Apr  4 19:17:56 1990 <<<

I don't know if it is a problem or not, but in the I-line develop
program #70 I see small bubbles on the surface of the wafer and 
sometimes the entire wafer isn't completely wetted.  I am just 
starting to use the I-line resist so I'm not up to speed on the
quirks of the system.

MJ

>>> 'mti' problem from debra -- Thu Apr  5 07:57:54 1990 <<<

The bubbles are normal and have not seemingly affected development.
The wafer edges are sometimes not completely wetted, but these
areas are not used anyway.

>>> 'mti' fix from rnorman -- Fri Apr  6 07:45:32 1990 <<<

Problem: Needle too far from wafer and producing bubbles.

Solution: The i-line developer needle was adjusted about 
         3/4" closer to the wafer; any more than that and
         I will have to modify the "bowl".  Debra wil test
         it out.  The mti is up.

>>> 'mti' problem from debra -- Mon Apr  9 10:22:23 1990 <<<

DI water leak, no water reaching nozzle for DI rinse.
mti is down

>>> 'mti' problem from bob -- Mon Apr  9 10:35:41 1990 <<<

The recirc water on the temp controll unit was valved off due
to a minor leak. The mti is running; however, the tcu needs
attention.

>>> 'mti' fix from debra -- Mon Apr  9 11:47:01 1990 <<<

mti available for use 

>>> 'mti' problem from rnorman -- Mon Apr  9 12:44:02 1990 <<<

The mti will be down to repair a water leak from the developer
heater reservoir.  You will be notified when it is up.

>>> 'mti' fix from rnorman -- Mon Apr  9 14:47:50 1990 <<<

Problem: Water leak from left developer heater reservoir, as reported.

Solution: The heater was removed and the hose cut and reconnected and
          the band clamp tightened.  The mti was also clean up a little
          and is up for use.

>>> 'mti' fix from rnorman -- Tue Apr 10 10:20:00 1990 <<<

Problem: Water leak still present.

Cause: The right developer heater reservoir had a
       leak from the cooling line, located under the reservoir.

Solution: The reservoir was removed and the cooling line trimmed
          down and connected tightly.

>>> 'mti' problem from jiahua -- Fri Apr 27 14:20:51 1990 <<<

One wafer stuck in the plat, but Robert fixed it.

>>> 'mti' problem from jlou -- Fri May 11 11:37:37 1990 <<<

tI use program #1 to develope my wafers. It seems that this program can
not fully develope photoresistor. It takes two times to get a clean
surface.
                                                              Jlou
