From voros Thu Apr  5 17:01:22 1990
Return-Path: <voros>
Received: by argon.berkeley.edu. (4.1/SMI-4.0)
	id AA25836; Thu, 5 Apr 90 17:00:40 PDT
Date: Thu, 5 Apr 90 17:00:40 PDT
From: voros (Katalin Voros)
Message-Id: <9004060000.AA25836@argon.berkeley.edu.>
To: mti
Subject: puddle developing
Cc: procestaff
Status: R

The nozzle cannot be moved closer to the surface due to its mechanical
design. Thanks for investigating this.

 	Katalin

From: debra (Debra Hebert)
To: voros, bob
Subject: mti and Olin Hunt developer
Date: Thu, 05 Apr 90 14:22:32 PDT

    Katalin, I further investigated the problem concerning the
    debris which appears during develop using the Olin Hunt
    developer. I strongly believe that it is tiny bubbles which
    are floating on the surface. These bubbles are a result of
    the pressurized delivery system we are currently using, and
    may be eliminated if we bring the nozzle closer to the wafer.
    So far, we haven't any evidence to indicate that these bubbles
    have a negative affect on the develop process.
	  Thank you, Debra
--------


