>>> 'lam2' problem from rnorman -- Tue Jan  2 13:21:32 1990 <<<

We have a serious problem with the gap drive.  We have a drive
motor out and possibly a bent worm gear or bad bearings.  I will
pull the upper electrode assembly and look closer at each gap motor.
It would be safe to say the lam2 will not be up at least until Friday.
Users repeatingly trying to use the lam2 WHEN REPORTED DOWN may have
contributed to the problem.

>>> 'lam2' problem from rnorman -- Wed Jan  3 06:31:30 1990 <<<

After looking more closely at the gap drive motors it was found that
3 gap drive motors went out; lam P/N 676-00504-003.   I will also be
replacing the gap brake; lam P/N 853-1845-1.  Since the upper electrode
is completely pulled out it is to our advantage to replace the brake now
and not wait until it fails; it is smooth and has a burnt look to it, a
sign of a "going out" brake according to Lam.  The above parts were ordered
and will be picked up today.  If all goes well the lam2 will be up by
Friday.

>>> 'lam2' problem from rnorman -- Wed Jan  3 14:54:47 1990 <<<

The gap motors have arrived and will be installed tomorrow morning. If
things go well the lam2 will be up for use early Friday.
Please make appointments for re-qualification.
***DO NOT OPERATE***

>>> 'lam2' problem from rnorman -- Thu Jan  4 14:58:00 1990 <<<

The motors have been installed and I am now adjusting the upper
electrode to be parallel with the lower electrode.  It should be
completed tomorrow on schedule. ***DO NOT OPERATE***
Please make an appointment to get re-qualified if you have not
already.

>>> 'lam2' problem from rnorman -- Fri Jan  5 15:47:53 1990 <<<

The electrodes are now parallel and the system is under vacuum.
A plasma clean was tempted but an RF mismatch occurred.  I think
a RF cable fried.***DO NOT OPERATE*** the lam will be down for the
weekend.

>>> 'lam2' problem from rnorman -- Mon Jan  8 10:57:48 1990 <<<

Problem: Gap not adjusting to proper setting.

Cause: 3 gap spacing motors went out and 1 motor could not
       drive gap.

Solution: All four motors were ordered and replaced.  The upper
          electrode was set parallel with the lower electrode to
          within 0.002" from corner to corner.  During a plasma test
          an RF Mismatch occurred do to an arc to wire inside the
          matching network. The wire was replaced and tie-wrapped down
          so not to repeat.  A plasma clean was ran successfully with
          no errors.  The lam2 is up.

>>> 'lam2' problem from mudie -- Fri Jan 12 14:13:58 1990 <<<

motor problem on lam2 from mudie (12-jan-1990 14:10)

User Comments:
pump stopped working after I tripped on power cord
test, please ignore

>>> 'lam2' problem from mudie -- Fri Jan 12 14:44:05 1990 <<<

motor problem on lam2 from mudie (12-jan-1990 14:10)

User Comments:
pump stopped working after I tripped on power cord
test, please ignore


Comments from mudie at 12-jan-1990 14:43 :
motor on order, due to arrive 1/15/90

>>> 'lam2' problem from mudie -- Fri Jan 12 15:00:27 1990 <<<

motor problem on lam2 from mudie (12-jan-1990 14:10)

User Comments:
pump stopped working after I tripped on power cord
test, please ignore


Comments from mudie at 12-jan-1990 14:43 :
motor on order, due to arrive 1/15/90

Comments from mudie at 12-jan-1990 15:00 :

clearing dummy problem

>>> 'lam2' problem from mudie -- Mon Jan 22 15:32:01 1990 <<<

testing lock function, please ignore

>>> 'lam2' problem from mudie -- Mon Jan 22 15:32:44 1990 <<<

clearing test problem

>>> 'lam2' problem from weijie -- Fri Jan 26 00:48:34 1990 <<<


Before I start my std process, the machine thought it has wafers
in the chamber and I had to use "clear chamber" and put a dummy
wafer on the receiving track to fool it.  Others are fine.

>>> 'lam2' problem from rnorman -- Fri Jan 26 06:14:52 1990 <<<

Problem: Had to use "Wafer clean out" before running.

Cause: If someone does a "process only" chamber clean
       you will get the "wafer in system" error even if no 
       wafers are in the system. 

Solution: If you know FOR SURE that no wafer is in the chamber you
          can clear the "wafer in system" error by toggling the 
          "wafer in system error" on the parameters page.  If you
          are not sure about a wafer in the chamber then you
          must run the "wafer clean out" to make sure any possible
          wafer is removed from the chamber.  This happens sometime,
          but it is not a problem.  The lam2 is up. 

>>> 'lam2' problem from parrish -- Fri Jan 26 06:59:35 1990 <<<

system down for repair of end bearing noise.

>>> 'lam2' problem from parrish -- Fri Jan 26 12:34:04 1990 <<<

problem:    end bearings of the blower noisy

cause:      need the bearings lubricated

solution:   removed end plate, removed old grease, and relubed bearings
            with Yvac 3 fomblin grease. system is up.

>>> 'lam2' problem from ried -- Sun Feb  4 18:05:46 1990 <<<

I started to etch a stack of wafers and walked away.  When I came
back I found that the first wafer had not come out of the etch chamber,
but the second wafer was already in the etch chamber, and the third
wafer was in the entrance load lock.  The alarm condition was that
no wafer had come onto the output belt.  I dropped a dummy wafer
onto the belt to clear the alarm, after which the machine brought
the second wafer into the output load lock and the third wafer into
the etch chamber.  Eventually the third wafer came out also.  I ran
the wafer clean out, but the problem is that THERE IS STILL A WAFER
STUCK IN THE ETCH CHAMBER SOMEWHERE.

>>> 'lam2' problem from rnorman -- Mon Feb  5 08:04:29 1990 <<<

Problem: Wafer lost in chamber.

Cause: Unknown, possibly do to polymer or PR on the back of the
       wafer; we will watch for further problems like this in the
       future.  The chamber was vented and a WHOLE wafer was removed
       and set on the top of the lam2.  A chamber clean was ran and
       the lam2 is up for use.

>>> 'lam2' problem from rnorman -- Tue Feb  6 11:28:51 1990 <<<

Lam2 RF power supply has is not turning on.  There is power out of
the plug, 208V, but the AC ON LED is not on;  the POWER switch
is on.  We may have lost a fuse internally or an internal supply.
Lam2 is down.

>>> 'lam2' problem from rnorman -- Tue Feb  6 14:44:59 1990 <<<

Problem: RF supply not turning on, no AC power.

Cause: The 2 line fuses, under the remote cable, were blown.

Solution: Replaced both fuses.  The lam2 is up.

>>> 'lam2' problem from aplee -- Fri Feb  9 15:28:46 1990 <<<

When I tried to etch through 2.2 um of oxide, using 750 watts power,
the opening holes become brownish and after a long time of etching,
the iv probing shows that it still isn't etched through. The probe 
can scratch off the brownish stuff a bit, and I can see greenish and
redish scratches. It is a critical step to me and some other guys.
>>> 'lam2' problem from aplee -- Fri Feb  9 15:35:22 1990 <<< [No Comment]

>>> 'lam2' problem from ried -- Sun Feb 11 17:55:54 1990 <<<

Status screen has "low water flow" flashing on screen and lam1 has "coolant ovrtmp"
flashing on screen, so I decide not to activate.  Please advise.

>>> 'lam2' problem from bob -- Mon Feb 12 08:22:56 1990 <<<

The DI cooling on lam2 dipped below the 10 megohm trip off
point indicating a decline in resistivity below the 10 megohm 
fault point on the chiller. This is turn shuts off the chiller. 

DI is produced by a shunt loop through a 10" resin bed. This
resin bed (10" filter size) is becoming exhausted will be 
replaced from stock. I have added this to rnormans techjobs.

Until then, the shunt loop flow has been increased from "2"
to "3" on the flow meter. This has raised the resistivity
to 15+ megohms.  The DI quality need only be ~2-4 megohms for 
proper operation of the lam2. The "fault off" setting has been 
at 10 megohms and I will discuss with rnorman the merits of 
lowering it to 5 megohms.

Ironically, checking the chiller is on the maintenance calendar and was
mailed out Feb 11th to rnorman! Resin saturation is difficult
to determine and it tends to drop quickly upon exhaustion.

lam2 is up!

>>> 'lam2' problem from tom -- Wed Mar  7 14:54:07 1990 <<<

CF4 flow 60 and dropping when it should be at 90.
I checked the gas bottle and it looks to be empty, zero presure
even though the valves are open. Needs to be changed.

>>> 'lam2' problem from evan -- Thu Mar  8 08:45:25 1990 <<<

A new FREON-14, CF4, cylinder has been installed.

>>> 'lam2' problem from rnorman -- Thu Mar  8 11:32:11 1990 <<<

The pressure rate of rise in the chamber is very high above
100 mt/min.  After lunch today I will vent the chamber up
and take a look inside; this will be about 12:30.  If 
an obvious problem is not found it could be down for
the rest of the day or even tomorrow.  If you have a 
problem with this, please inform ASAP today.

>>> 'lam2' problem from rnorman -- Thu Mar  8 14:40:57 1990 <<<

The lam2 will be leak checked tomorrow morning to find the massive
leak.  Doing a ROR test it was found to be 327mt/min; this is not
a leak this is a hole.  If you do not mind the leak, you can operate
the lam2, because tomorrow when I start leak checking the lam2 will
be down until it is found.

>>> 'lam2' problem from rnorman -- Fri Mar  9 13:21:48 1990 <<<

Problem: The ROR in the chamber was very high, more then 200 mt/min.

Cause: Both Chamber Isolation valves were leaking across the 80 psi drive
       seal, causing a massive leak.

Solution: Both iso valves were rebuilt, replacing o-rings and repacking.
          The lam2 was tested and the ROR is much better, though a little
          high due to outgassing of the newly rebuilt valves; after a
          couple hours being under vacuum the ROR will decrease.  The
          lam2 is up.

>>> 'lam2' problem from rnorman -- Wed Mar 21 11:16:20 1990 <<<

We are getting "Warning: transmit error".  This has to do with
the SECS communication and will not effect your process, so
please ignore.  The lam2 is up.

>>> 'lam2' problem from cjkim -- Thu Mar 22 01:47:38 1990 <<<

Have damaged PR (dots all over the wafer) after 1min 45sec standard
recipe O2 etch.

>>> 'lam2' problem from rnorman -- Thu Mar 22 07:29:24 1990 <<<

User reported dots all over his wafer.  I have seen this problem
before, if the dots are uniform over the wafer.  This is cause by
the gap space being too close to the wafer for the process that
is being ran.  The lams are set up for one type of process,
for a specific type of process wafer and thickness, if deviations
from this are ran problems may and have occurred.  I would like to
see the wafer that has the dots to help correct problem; please
contact me.

>>> 'lam2' problem from bob -- Fri Mar 23 10:57:33 1990 <<<

The following maintenance will be performed on lam2 to re-establish
a reproduceable baseline oxide etch process:

1) Physical inspection of chamber by Process Staff
   Supervisor/Lab Mgr
2) Replacement of the upper electrode (save old for backup)
3) Cleaning of the chamber and windows
4) Clean of the vacuum manifold
5) Replacement of the oil filters
6) Calibration of all analog inputs
7) RF calibration
8) Calibrate mfc's
9) Process staff to run a standard SiO2 contact etch

The above maintenance will require 3 days of work and will
commence on Tuesday, March 27th. lam2 will be down for this
period. Results will be posted upon completion.

>>> 'lam2' problem from jlou -- Sun Mar 25 23:13:57 1990 <<<

After I finish my Betching job, I load clean chamble recipe. I find the pressre is not correct. Lam 2 is in loop stable waiting step.
                                                                        Jlou

>>> 'lam2' problem from rnorman -- Mon Mar 26 07:45:03 1990 <<<

When I came upon the lam2 CF4 was flowing at 90 sccm and the pressure
was trying the stabilize at 2.8 torr.  The pressure fluctuates from
2.776 to 2.822 torr; I do not remember what the normal pressure
fluctuations are, but this seems too much.  I reset the system to
stop CF4 flow and ran a plasma clean for a test.  The pressure
stabilized per say, that is there was no loop error, but the
pressure still fluctuates when running the "clean".
I will look into this fluctuation problem.  The RF power is not
fluctuating, just the process pressure.  You may run the lam2 if
this problem does not effect your process.

>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>

the upper graphite electrode on lam2 can be resurfaced and
purified by POCO Graphite of Decatur, Texas. The contact
at POCO is Ran Mead. The cost is $80.00 and minimum billing
is $200. 2 electrodes have been sent and return time is
estimated @ 4-5 weeks. Another user of this their service
is Intel.

POCO Graphite Inc.
1601 South State St
Decatur, Texas
800-433-5547

>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>

>>> 'lam2' problem from bob -- Tue Mar 27 14:13:44 1990 <<<

lam2 is down for a chamber. It should be returned for service
after requalification by the Process Supervisor. This should be
Thursday, April 5th in the am.

>>> 'lam2' problem from rnorman -- Tue Mar 27 15:02:48 1990 <<<

The upper electrode is replaced and the chamber is clean.  Tomorrow
I will calibrate the electronics.  It should be up for use by tomorrow
night.

>>> 'lam2' problem from rnorman -- Wed Mar 28 14:37:52 1990 <<<

So far so good!  Everything is pretty much in alignment or
adjustment.  I will give a detailed write up tomorrow when
I finish.  I still have to complete the RF alignment and
check the gap spacing.  It MAY be done by noon tomorrow,
but for sure sometime tomorrow.
s

>>> 'lam2' problem from parrish -- Thu Mar 29 12:32:34 1990 <<<

the oil filter elements has been changed.

>>> 'lam2' problem from rnorman -- Thu Mar 29 12:32:04 1990 <<<

Problem: Yearly PM on lam2

Solution: Below is a list of what was done:

 1) Graphite upper electrode was replaced.
 2) Chamber was totally cleaned; windows, side walls, electrode.
 3) Calibration of Analog System; was right on.
 4) Pressure manometer zero calibration; used Vacuum General
    precision manometer as a reference, off by 2 mt.
 5) MFC zero calibration; some off by 2-3 sccm.
 6) Calibration of the RF Interface Board; reflected power indicated
    lower then actual by 2-3 watts.
 7) Electrode Parallelism and Gap Spacing calibration; was parallel
    with in .002" at outer edge of electrode(after graphite electrode
    change).  Gap spacing was off by +37 counts or a .0187" larger gap.

All in All the system was pretty much in calibration.  Cleaning wise, 
this is the CLEANEST the chamber has ever been, because I scrubbed the
side walls this time.  At this time Debra is running a process check
of the system.  The lam2 is ready for use.

>>> 'lam2' problem from tom -- Thu Mar 29 16:24:35 1990 <<<

Test etch ran after total system clean.

	A 30 second test etch was ran on a thermal oxide wafer.
Using the standard etch recipe, low selectivity etch with no overetch
the etch depth (on average) was 2240 A. 

	This gives an etch rate of 4480 A/min.

	Another identical wafer was etched to clear and took about 
1 min. 10 seconds to clear (L/S etch) and then the standard 20 sec.
H/S overetch. Inspection reveals a nice clear etch. Endpoint looked
good. BTW, both wafers had 5000 A thermal oxide and had the dark 
field resolution mask on them.

*** No nitride etch allowed until further notice! ***

>>> 'lam2' fix from phillip -- Wed Apr 11 11:40:02 1990 <<<

Connected lamlink #2 to argon computer. It should
be up and running barring any software modifications
that Lauren needs to make.

r.p.o.  ttyh3 to ml 2/3 to TW/4 to lam2

>>> 'lam2' problem from jimmoon -- Tue Apr 17 07:29:59 1990 <<<

Etched 23 wafers, as reported in comment log.  There
were many "RF MISMATCH" errors, which caused the etch to terminate
after 11-13 seconds.  This didn't happen every time; 
occasionally (about once every ten etches or so) it would
etch just fine for the 40 seconds that I needed.
I was using the standard etch recipe, modified so that only
step #2 (the low selectivity, 850W) step was being used for
etching.

>>> 'lam2' fix from rnorman -- Wed Apr 18 13:12:25 1990 <<<

Problem: RF mismatch error after about 11-13 seconds into process.

Cause: Jimmoon  thinks the problem is with his wafers not the lam2.

Solution: See jimmoon's comment concerning this problem.  The lam2 is up.

>>> 'lam2' fix from rnorman -- Mon Apr 23 11:59:08 1990 <<<

Problem: RF mismatch error at about 10 seconds into process.

Cause: It could be many things but I did find the blower OFF.

Solution: The blower was turned back on, also the "blower alarm".
         It could have been off since last week when jimmoon was having
         problems.  The lam2 is up for use.

>>> 'lam2' fix from rnorman -- Mon May  7 08:57:39 1990 <<<

Problem: Blower power box cover removed/broken.

Solution: The cover was replaced.  This is to protected the blower
        from being turned off accidently.

>>> 'lam2' problem from judy -- Mon May 14 09:40:54 1990 <<<

RF power mismatch on clean proceedure.  The control panel is hung.  Help?!

>>> 'lam2' problem from rnorman -- Tue May 15 07:22:52 1990 <<<

The electronics were locked up and the lam 2 needed reset.  I will inspect
the chamber today to see if it needs cleaned.  

NOTE: the lam2 is UP for use.
